Director ES BU, Marketing
Tokyo Electron America, inc.
Mechanicville, NY, United States
Angélique Raley is currently Director of plasma etch business & marketing in Tokyo Electron America. Her current focus is on enabling US based customers with differentiated etch solutions. Prior to this she worked as a plasma etch process development engineer and later on led a plasma process development group in Albany, NY. Her work focused on developing plasma etch processes for advanced logic devices. She received her M.S. in materials science and engineering from Polytech’ Grenoble, France and started her career in the semiconductor industry as an integration engineer working for Samsung in flash memory before joining TEL in 2010. Angélique has been an active member of the semiconductor research community and has contributed through multiple conference papers, invited talks and 40 granted patents to the steadfast advancement of key technologies to enable our customers’ success.
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Outlook for Advanced Logic Era: Process Innovation to Address Scaling Challenges
Thursday, July 13, 2023
11:15 AM – 11:35 AM PDT