Expo Pass
Expo Plus Pass
Thought Leadership Pass
All-In Pass
Student Explorer Pass
The focus of this session on the specific use cases of AI/ML to enable key operations such as anomaly detection (FDC), quality (Yield management), SPC, etc. as well as advanced predictive maintenance and virtual metrology enhanced by new AI/ML approaches within manufacturing lines will be in focus.
Session Moderator: Ranjan Chatterjee – PDF Solutions
Speaker: Jae-Yong Park, PhD – Samsung
Speaker: Wes Smith, MBA – Galaxy Semiconductor
Speaker: Srividya Jayaram, MS – Siemens EDA
Speaker: Christopher Nguyen, PhD – Aitomatic
Speaker: Melvin Lee Wei Heng – ONTO INNOVATION
Speaker: Mike Y. H Kim, PhD – Gauss Labs
Speaker: Andrea Ruotolo, Fulbright PhD – Rockwell Automation
Speaker: Warren Roos, PhD, PE – Rockwell Automation
Session Moderator: Ranjan Chatterjee – PDF Solutions